文章摘要
贾卫平.垂直磁场作用下电沉积数值分析与实验[J].,2013,53(5):671-677
垂直磁场作用下电沉积数值分析与实验
Numerical analyses and experiments of electrodeposition in vertical magnetic field
  
DOI:10.7511/dllgxb201305009
中文关键词: 电沉积  磁场  数值模拟  流场  电场
英文关键词: electrodeposition  magnetic field  numerical simulation  flow field  electric field
基金项目:国家自然科学基金资助项目(50975034);辽宁省科技计划资助项目(2010223006)
作者单位
贾卫平  
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中文摘要:
      对电沉积过程中磁场、电场和流场进行数值分析并利用COMSOL仿真软件进行数值求解,得到了无磁场作用和0.2 T垂直磁场作用下流体流场分布、镀液中电场分布以及不同时间段镀层厚度变化特征的数值结果,并对其进行了对比分析.为了解磁场对电沉积过程的影响规律,分别在施加0、0.2、0.4和0.8 T磁场作用下电沉积镍,对比实验和数值分析结果表明,镀层厚度仿真值和实验值变化趋势接近,无磁场条件下平均绝对偏差为0.443 μm,0.2 T磁场条件下平均绝对偏差为0.425 μm.施加0.2 T垂直磁场作用后,镀层的平均厚度较无磁场作用下增加了11%,与仿真结果一致,并且随着磁场强度的增加,镀层晶粒细化度、表面质量得到进一步提高.分析结果表明数值分析可以较为精确地反映磁场对电沉积过程的影响作用.
英文摘要:
      The coupling mathematical model of magnetic field, electric field and flow field in the electrodeposition process is established and numerically simulated by using COMSOL. The numerical results are obtained and comparatively analyzed, which are the distribution of the fluid flow field, the electric field distribution characteristics of the bath and the coating thickness variation characteristics in different periods of the plating without magnetic field and in 0.2 T vertical magnetic field. In order to study the effect law of magnetic field on the electric deposition process, electrodeposited nickel experiments are conducted in the conditions of 0, 0.2, 0.4 and 0.8 T vertical magnetic field. The experimental results show that the simulated value of coating thickness variation tendency is close to the experimental value, and the average absolute deviation is 0.443 μm without magnetic condition and 0.425 μm in 0.2 T magnetic ield.
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