文章摘要
磁控溅射制备AlCrWTaTiNb高熵合金薄膜低温等离子体氮化
Low Temperature Plasmatic Nitriding of AlCrWTaTiNb film Synthesized by Magnetron Sputtering
投稿时间:2018-05-11  修订日期:2018-05-18
DOI:
中文关键词: 多元高熵合金薄膜  低温渗氮  机械性能
英文关键词: Multi-component alloy films  Low temperature nitrides  Mechanical property
基金项目:国家国际科技合作专项(2015DFR60370);航空科学基金(20153663010).
作者单位E-mail
马 铭 大连理工大学 材料科学与工程学院 1246221446@mail.dlut.edu.cn 
任 瑛   
侯 晓 多 大连理工大学 材料科学与工程学院  
陈 国 清 大连理工大学 材料科学与工程学院  
张 贵 锋 大连理工大学 材料科学与工程学院 三束材料改性教育部重点实验室 gfzhang@dlut.edu.cn 
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中文摘要:
      采用磁控溅射技术沉积了AlCrWTaTiNb多主元高熵合金薄膜,在400 °C以下对沉积的薄膜进行了氮化处理。用X射线衍射(XRD)、原子力显微镜和纳米压痕对氮化后薄膜的微观结构、表面行貌以及力学性能进行了分析。结果表明,高熵效应有利于降低氮化温度,最低氮化温度仅为200 °C,所有的(AlCrWTaTiNb)N氮化物薄膜晶体结构呈现简单的FCC结构,且具有(1 1 1)择优取向。渗氮温度为300 °C时,(AlCrWTaTiNb)N复合薄膜的显微硬度、弹性模量和对应的H3/E2值达到最大。随渗氮时间的延长,显微硬度和弹性模量均逐渐增加。
英文摘要:
      Multi-component high entropy AlCrWTaTiNb films were prepared using magnetron sputtering technique and then were nitrided below 400°C by means of a high density plasma equipment. The microstructure, surface morphology, and mechanical properties of the multi-component high entropy (AlCrWTaTiNb)N films have been investigated by X ray diffraction (XRD), atomic force microscopy, and nano indentation, respectively. The results show that the lowest nitriding temperature is only 200°C in the experimental conditions and the high entropy effect is really propitious to reduce nitriding temperature. All the (AlCrWTaTiNb)N films are a simple FCC structure with a (111) preferred orientation. With the increase of nitriding temperature, the hardness, the elastic modulus, and the corresponding H3/E2of the (AlCrWTaTiNb)N composite films reach a maximum and then decrease slightly. With the prolongation of nitriding time, the micro-hardness and elastic modulus increase gradually.
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