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| 磁控溅射制备AlCrWTaTiNb高熵合金薄膜低温等离子体氮化 |
| Low Temperature Plasmatic Nitriding of AlCrWTaTiNb film Synthesized by Magnetron Sputtering |
| 投稿时间：2018-05-11 修订日期：2018-05-18 |
| DOI： |
| 中文关键词: 多元高熵合金薄膜 低温渗氮 机械性能 |
| 英文关键词: Multi-component alloy films Low temperature nitrides Mechanical property |
| 基金项目:国家国际科技合作专项(2015DFR60370)；航空科学基金(20153663010). |
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| 中文摘要: |
| 采用磁控溅射技术沉积了AlCrWTaTiNb多主元高熵合金薄膜,在400 °C以下对沉积的薄膜进行了氮化处理。用X射线衍射(XRD)、原子力显微镜和纳米压痕对氮化后薄膜的微观结构、表面行貌以及力学性能进行了分析。结果表明,高熵效应有利于降低氮化温度,最低氮化温度仅为200 °C,所有的(AlCrWTaTiNb)N氮化物薄膜晶体结构呈现简单的FCC结构,且具有(1 1 1)择优取向。渗氮温度为300 °C时,(AlCrWTaTiNb)N复合薄膜的显微硬度、弹性模量和对应的H3/E2值达到最大。随渗氮时间的延长,显微硬度和弹性模量均逐渐增加。 |
| 英文摘要: |
| Multi-component high entropy AlCrWTaTiNb films were prepared using magnetron sputtering technique and then were nitrided below 400°C by means of a high density plasma equipment. The microstructure, surface morphology, and mechanical properties of the multi-component high entropy (AlCrWTaTiNb)N films have been investigated by X ray diffraction (XRD), atomic force microscopy, and nano indentation, respectively. The results show that the lowest nitriding temperature is only 200°C in the experimental conditions and the high entropy effect is really propitious to reduce nitriding temperature. All the (AlCrWTaTiNb)N films are a simple FCC structure with a (111) preferred orientation. With the increase of nitriding temperature, the hardness, the elastic modulus, and the corresponding H3/E2of the (AlCrWTaTiNb)N composite films reach a maximum and then decrease slightly. With the prolongation of nitriding time, the micro-hardness and elastic modulus increase gradually. |
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